Real-time characterization of structural and compositional evolution of ultrathin films

Tidsperiod: 2017-01-01 till 2020-12-31

Projektledare: Daniel Primetzhofer

Finansiär: Vetenskapsrådet

Bidragstyp: Bidrag för anställning eller stipendier

Budget: 4 000 000 SEK

In this project we will apply TOF-MEIS (Time-Of-Flight Medium-Energy Ion Scattering), a novel non-destructive method for near surface analysis and depth profiling at nanometer depth scales, for characterization of ultrathin films of metal-oxides, silicides and germanides. We will thus gain new knowledge on fundamental properties, growth and modification of materials relevant for fabrication of high quality electronics and sensors together with introducing a novel powerful method for characterization of ultra-thin films. We will obtain high-precision information on film quality and interface properties and measure quantitatively film thickness, stoichiometry and crystallinity. In course of the project the analytical capabilities of our system will be enhanced to yield real-time information on material modification induced by thermal annealing of the systems simulating important manufacturing steps and thermal loads during application. The following goals are defined for the project:1) Obtain maximum depth resolution and absolute depth perception by characterization of ion-solid interaction in ultrathin films of the model systems.2) Quantify single crystalline quality and thin-film composition from 3D-intensity spectra (angular distribution and depth).3) Investigate formation and thermal stability of metal oxides, silicieds and germanides by in-situ, real time experiments.4) Characterize in-situ recrystallization and compositional changes during post-implantation annealing.